產(chǎn)品編碼	Dia. (mm)	基底	涂層
21-172	0.18 (of each lens)	Fused Silica (Corning 7980)	BBAR (1260-1675nm), Lens Side
21-173	0.18 (of each lens)	Fused Silica (Corning 7980)	BBAR (1260-1675nm), Lens Side
21-174	0.53 (of each lens)	Fused Silica (Corning 7980)	BBAR (1250-1620nm)
21-175	0.53 (of each lens)	Fused Silica (Corning 7980)	BBAR (1250-1620nm)
21-176	0.23 (of each lens)	Silicon	BBAR (1250-1620nm)
21-177	0.23 (of each lens)	Silicon	BBAR (1250-1620nm)
21-178	0.69 (of each lens)	Silicon	BBAR (1250-1620nm)
21-179	0.69 (of each lens)	Silicon	BBAR (1250-1620nm)
21-180	0.69 (of each lens)	Silicon	BBAR (1250-1620nm)
21-181	0.69 (of each lens)	Silicon	BBAR (1250-1620nm)
21-182	0.53 (of each lens)	Silicon	BBAR (1250-1620nm)
21-183	0.53 (of each lens)	Silicon	BBAR (1250-1620nm)

線性微透鏡陣列采用熔融石英和硅材料基底，由4個(gè)或8個(gè)透鏡組成。硅材料折射率高，可實(shí)現(xiàn)短焦距、高數(shù)值孔徑透鏡陣列設(shè)計(jì)，而熔融石英具有良好的熱穩(wěn)定性和可見(jiàn)光傳輸，便于對(duì)準(zhǔn)。用于在光纖到光纖或激光到光纖應(yīng)用中準(zhǔn)直和耦合光纖陣列，例如與半導(dǎo)體激光二極管一起使用。這些透鏡為近紅外（NIR）設(shè)計(jì)了增透鍍膜，用于1310和1550nm，是近紅外激光器或電信設(shè)備的理想選擇。